Predicting Thin Film Stoichiometry In V-O2 Reactive Sputtering
نویسندگان
چکیده
منابع مشابه
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ژورنال
عنوان ژورنال: Materials Science
سال: 2015
ISSN: 2029-7289,1392-1320
DOI: 10.5755/j01.ms.21.2.6910